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D. B. MacMillen

dblp:06/1655 · DBLP profile ↗
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1ranked-venue papers
0as first author
0since 2021 · last 1985
—ORCID · none

Domains — the database's venue-derived domains; a paper can count in several

Systems, architecture and hardware · 1

Expertise — from the expertise taxonomy: the topics of the expert's papers under the CCF categories. A weight counts papers with recency: 1 for a paper about the topic, 0.3 when the topic is its context, halved every five years.

Computer architecture, parallel and distributed computing, and storage systems
1 paper
Electronic design automation · 100%

Topics — the 4 heaviest of 4, each with the papers that count most for it

TopicWeightPapersLastEvidence papers
Electronic design automation
circuit simulation
0.011985
Practical Integration of Process, Device, and Circuit Simulation · IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 1985
Electronic design automation › technology computer-aided design
device simulation
0.011985
Practical Integration of Process, Device, and Circuit Simulation · IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 1985
Electronic design automation › technology computer-aided design
process simulation
0.011985
Practical Integration of Process, Device, and Circuit Simulation · IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 1985
Electronic design automation › circuit modeling
parameter extraction
0.011985
Practical Integration of Process, Device, and Circuit Simulation · IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 1985

Methods — techniques the papers use, named apart from their topics

optimization techniques · 0.0impurity concentration interpolation · 0.0
YearPublicationVenuePosition
1985 Practical Integration of Process, Device, and Circuit Simulation
abstract
Readily available process, device, and circuit simulation programs have been integrated into an effective system for enhancing semiconductor product development. In this paper, the system will be discussed with particular emphasis on the problems encountered in making simulation tools accessible to users. Each of the primary programs is reviewed, and the modifications and enhancements which have been made to adapt the programs to our requirements are discussed. The problem of interpolating impurity concentration profiles between process simulation grids and device simulation grids is discussed. The link between device simulation and circuit simulation is parameter extraction. The application of optimization techniques for parameter extraction is considered.
R. I. Sokel, D. B. MacMillen
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst.2