Huan Zou

dblp:117/1986 · DBLP profile ↗
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5ranked-venue papers
1as first author
3since 2021 · last 2026
—ORCID · conflict

Domains — the database's venue-derived domains; a paper can count in several

Security and privacy · 4 · 1 first-author · 3 since 2021Systems, architecture and hardware · 1
YearPublicationVenuePosition
2026 OptiVersa-ECDSA: Fast Threshold-ECDSA With Cheater Identification for Blockchains
Yunlv Lv, Yang Tao 0001, Zeshuo Zhu, Huan Zou, Rui Zhang 0002
IEEE Trans. Dependable Secur. Comput.4
2024 NEST: Strong Key-Insulated Password-Based Shared-Custodial Blockchain Wallets
Birou Gao, Huan Zou
Inscrypt (1)4
2023 Semi-Honest 2-Party Faithful Truncation from Two-Bit Extraction
Huan Zou, Rui Zhang 0002
ICICS1
2020 Distributed Key Generation for SM9-Based Systems
Rui Zhang 0002, Huan Zou, Yang Tao 0001
Inscrypt2
2012 Short Pulse Generation With On-Chip Pulse-Forming Lines
abstract
We report our results on pulse-forming-line (PFL)-based CMOS pulse generator studies. Through simulations, we clarify the effects of PFL length, switch speed, and switch resistance on the output pulses. We model and analyze CMOS pulse generators with on-chip transmission lines (TLs) as PFLs and CMOS transistors as switches. In a 0.13- μm CMOS process with a 500- μm long PFL, post-layout simulations show that pulses of 10.4-ps width can be obtained. High-voltage and high-power outputs can be generated with other pulsed power circuits, such as Blumlein PFLs with stacked MOSFET switches. Thus, the PFL circuit significantly extends short and high-power pulse generation capabilities of CMOS technologies. A CMOS circuit with a 4-mm-long PFL is implemented in the commercial 0.13- μm technology. Pulses of ~116-ps duration and 205-300-mV amplitude on a 50-Ω load are obtained when the power supply is tuned from 1.2 to 1.6 V. Measurement connection setup is the main reason for the discrepancies among measurements, modeling, and simulation analyses.
Yongtao Geng, Huan Zou, Chaojiang Li, Jiwei Sun, Haibo Wang 0005, Pingshan Wang
IEEE Trans. Very Large Scale Integr. Syst.2