Emerging non-volatile resistive memories like Spin-Transfer Torque Magnetic Random Access Memory (STT-MRAM) and Resistive RAM (RRAM) are in the focus of today’s research. They offer promising alternative computing architectures such as computation-in-memory (CiM) to reduce the transfer overhead between CPU and memory, usually referred to as the memory wall, which is present in all von Neumann architectures. A multitude of architectures with CiM capabilities are based on these devices, due to their inherent resistive behavior and thus their ability to perform calculation directly within the memory, and thus without invoking the CPU at all. However, emerging memories are sensitive to Process, Voltage and Temperature (PVT) variations. This sensitivity has an even larger impact on CiM architectures. In this paper, we analyze and compare the impact of PVT variations on STT-MRAM and RRAM-based CiM architectures. We perform a sensitivity analysis to identify which parts of the CiM structure are most susceptible to PVT variations, for each technology. Based on these analyses, we recommend that STT-MRAM is used in high-performance CiM, while RRAM is used for edge CiM.

High-quality memory diagnosis methodologies are critical enablers for scaled memory devices as they reduce time to market and provide valuable information regarding test escapes and customer returns. This paper presents an efficient Hierarchical Memory Diagnosis (HMD) approach that accurately diagnoses faults in the entire memory. Faults are diagnosed hierarchically; first, their location, then their nature (i.e., static or dynamic), and finally, their functional fault model. The HMD approach leads to a more accurate diagnostic, enabling the precise identification of yield loss causes.

Resistive RAM (RRAM) is a promising technology to replace traditional technologies such as Flash, because of its low energy consumption, CMOS compatibility, and high density. Many companies are prototyping this technology to validate its potential. Bringing this technology to the market requires high-quality tests to ensure customer satisfaction. Hence, it is of great importance to deeply understand manufacturing defects and accurately model them to develop optimal tests. This paper presents a holistic framework for defect and fault modeling that enables the development of optimal tests for RRAMs. An overview and classification of RRAM manufacturing defects are provided. Defects in contacts and interconnects are modeled as resistors. Unique RRAM defects, e.g., forming defects, require Device-Aware defect modeling which incorporates the defect’s impact on the device’s electric properties by adjusting the affected technology and electrical parameters. Additionally, a systematic approach to define the fault space is presented, followed by a methodology to validate this space. With this methodology, accurate fault modeling for contact, interconnect, and forming defects is performed and tests are developed. The tests are able to detect all faults in a time-efficient manner, thereby proving the effectiveness of the framework. Finally, an outlook on future RRAM testing is presented.

Industry is prototyping and commercializing Resistive Random Access Memories (RRAMs). Unfortunately, RRAM devices introduce new defects and faults. Hence, high-quality test solutions are urgently needed. Based on silicon measurements, this paper identifies a new RRAM unique fault, the Intermittent Undefined State Fault (IUSF); this fault causes the RRAM device to intermittently change its switching mechanism from bipolar to complementary switching, resulting in undefined state faults. First, we characterize the IUSF by analyzing RRAM devices, and demonstrate that a single RRAM device can suffer from the IUSF up to 1.068 % of its switching cycles; we relate the IUSF to two defects: capping layer doping, and over-forming. This clearly shows the importance of detecting this fault. Second, we develop a device-aware defect model that accurately describes the physical behavior of these defects and gives essential insights into the IUSF's behavior and its detection. Third, we perform fault modeling by applying the device-aware defect model, and the results are used to develop high-quality test solutions for the IUSF. The contributions in this work improve the overall RRAM test quality, which enables mass commercialization of RRAMs.

Manufacturing defects in FinFET SRAMs can cause hard-to-detect faults such as Random Read Faults (RRFs). Detection of RRFs is not trivial, as they may not lead to incorrect outputs. Undetected RRFs become test escapes, which might lead to no-trouble-found devices and early in-field failures. Therefore, the detection of RRFs is of utmost importance. This paper proposes test solutions to detect RRFs and reduce test escapes. To achieve this, we first statistically analyze the failure rate due to RRFs, followed by an experimental study of stress conditions’ (SCs) impact on detecting RRFs, such as test algorithms, supply voltage, and temperature. Based on the results, we propose a new Design-For-Testability (DFT) scheme for FinFET SRAMs to detect such faults using SCs that improve the detection rate of RRFs. This scheme introduces a negligible area and test time overhead while significantly enhancing RRF detection. Hence, using the proposed DFT leads to reduced test escapes and, consequently, higher-quality FinFET SRAMs.

Abstract Fin Field-Effect Transistor (FinFET) technology enables the continuous downscaling of Integrated Circuits (ICs), using the Complementary Metal-Oxide Semiconductor (CMOS) technology in accordance with the More Moore domain. Despite demonstrating improvements on short channel effect and overcoming the growing leakage problem of planar CMOS technology, the continuity of feature size miniaturization tends to increase sensitivity to Single Event Upsets (SEUs) caused by ionizing particles, especially in blocks with higher transistor densities such as Static Random-Access Memories (SRAMs). Variation during the manufacturing process has introduced different types of defects that directly affect the SRAM's reliability, such as weak resistive defects. As some of these defects may cause dynamic faults, which require more than one consecutive operation to sensitize the fault at the logic level, traditional test approaches may fail to detect them, and test escapes may occur. These undetected faults, associated with weak resistive defects, may affect the FinFET-based SRAM reliability during its lifetime. In this context, this paper proposes to investigate the impact of ionizing particles on the reliability of FinFET-based SRAMs in the presence of weak resistive defects. Firstly, a TCAD model of a FinFET-based SRAM cell is proposed allowing the evaluation of the ionizing particle’s impact. Then, SPICE simulations are performed considering the current pulse parameters obtained with TCAD. In this step, weak resistive defects are injected into the FinFET-based SRAM cell. Results show that weak defects can positively or negatively influence the cell reliability against SEUs caused by ionizing particles.

Manufacturing defects can cause hard-to-detect (HTD) faults in fin field-effect transistor (FinFET) static random access memories (SRAMs). Detection of these faults, such as random read outputs and out-of-spec parametric deviations, is essential when testing FinFET SRAMs. Undetected HTD faults result in test escapes, which lead to early in-field failures. This article presents a detailed analysis of HTD faults in FinFET SRAMs by exploring their sensitization and discussing solutions to improve HTD fault coverage during manufacturing testing. We first define the fault space for SRAMs and classify all faults in the space. Following this, we perform a systematic fault analysis based on injecting resistive defects in a memory cell, inspecting its behavior, and identifying HTD faults. Furthermore, we survey existing test solutions and discuss their HTD fault coverage and limitations. Based on our analysis, it is clear that no single test solution can fully detect all HTD faults, thus leading to test escapes. Hence, there is a need for new and more efficient test solutions. Improved detection of HTD faults could be achieved by using parametric test solutions, proposing solutions that cover yet-untargeted HTD faults, combining multiple test approaches into a single solution, and further exploring stress conditions. These new approaches would reduce test escapes and therefore improve the quality of FinFET SRAMs.

Manufacturing defects can cause faults in FinFET SRAMs. Of them, easy-to-detect (ETD) faults always cause incorrect behavior, and therefore are easily detected by applying sequences of write and read operations. However, hard-to-detect (HTD) faults may not cause incorrect behavior, only parametric deviations. Detection of these faults is of major importance as they may lead to test escapes. This paper proposes a new design-for-testability (DFT) scheme for FinFET SRAMs to detect such faults by creating a mismatch in the sense amplifier (SA). This mismatch, combined with the defect in the cell, will incorrectly bias the SA and cause incorrect read outputs. Furthermore, post-silicon calibration schemes can be used to avoid over-testing or test escapes caused by process variation effects. Compared to the state of the art, this scheme introduces negligible overheads in area and test time while it significantly improves fault coverage and reduces the number of test escapes.

Hard-to-detect faults such as weak and random faults in FinFET SRAMs represent an important challenge for manufacturing testing in scaled technologies, as they may lead to test escapes. This paper proposes a Design-for-Testability (DFT) scheme able to detect such faults by monitoring the bitline swing of FinFET memories. Using only five operations per cell, we are able to detect defects that cause deterministic, random, and weak faults. Compared to the state of the art, this leads to an improved detection capability at reduced area overhead.

The STT-MRAM manufacturing process involves not only traditional CMOS process steps, but also the integration of magnetic tunnel junction (MTJ) devices, the data-storing elements. This paper demonstrates a paradigm shift in fault modeling for STT-MRAMs by performing defect modeling and fault analysis for MTJ pinhole defects which are seen as a key type of STT-MRAM manufacturing defects. A Verilog-A compact model for defect-free MTJ devices is built and calibrated with electrical measurements on actual MTJ wafers. MTJs with a pinhole defect are extensively characterized, both during manufacturing test (t=0) and in the field (t>0), and the data is used to extend our defect-free MTJ compact model to include parameterized pinhole defects. The model is then used to perform single-cell static fault analysis and this shows not only what kind of faults can occur in an STT-MRAM, but also that the conventional fault modeling approach based on linear resistors cannot catch such behavior.

This paper proposes a new test approach that goes beyond cell-aware test, i.e., device-aware test. The approach consists of three steps: defect modeling, fault modeling, and test/DfT development. The defect modeling does not assume that a defect in a device (or a cell) can be modeled electrically as a linear resistor (as the traditional approach suggests), but it rather incorporates the impact of the physical defect on the technology parameters of the device and thereafter on its electrical parameters. Once the defective electrical model is defined, a systematic fault analysis (based on fault simulation) is performed to derive appropriate fault models and subsequently test solutions. The approach is demonstrated using two memory technologies: resistive random access memory (RRAM) and spin-transfer torque magnetic random access memory (STT-MRAM). The results show that the proposed approach is able to sensitize faults for defects that are not detected with the traditional approach, meaning that the latter cannot lead to high-quality test solutions as required for a defective part per billion (DPPB) level. The new approach clearly sets up a turning point in testing for at least the considered two emerging memory technologies.

The miniaturization of CMOS technology is likely to reach its limit due to short-channel effects. New transistor technologies, including FinFET technology, were developed to deal with this effect and enable the continuous scaling-down of technological nodes. Alongside the constant scale-down of integrated circuits technology, the increasing need to store more and more information has resulted in the fact that Static Random Access Memories (SRAMs) occupy great part of Systems-on-Chip (SoCs). The manufacturing process variation has introduced different types of defects that directly affect the SRAM's reliability. Thus, it remains unknown if fault models used to characterize faults in CMOS memory circuits are sufficiently accurate to represent the behavior of FinFET-based memories. In this context, a study of functional implications of manufacturing resistive defects in FinFET-based SRAMs is presented. In more detail, a fault model for FinFET-based SRAMs as well as a complete analysis of the static and dynamic fault behavior are presented. The proposed analysis has been performed by means of SPICE simulations, adopting a 20nm technology library. The faults were categorized in single and coupling, static and dynamic faults.