This paper presents an experimental-procedure-driven method for modeling and equipment quantity configuration of high-throughput automated materials experimentation platforms. The method integrates a hybrid-automata-inspired process model, a structured equipment dictionary, and experimental-procedure-to-equipment mapping to construct a unified platform model for timing and dependency analysis under practical constraints. Based on this model, equipment quantity configuration is formulated as a constrained integer nonlinear optimization problem and solved using an integer-coded differential evolution algorithm. A thermal insulation coating case study demonstrates the modeling procedure and resulting configuration scheme. The experiments show reduced operation time relative to manual execution and smaller standard deviations in coating transmittance. This study focuses on equipment quantity configuration rather than full platform layout and integration design.

Abstract Real‐time ray tracing (RTRT) is being pervasively applied. The key to RTRT is a reliable denoising scheme that reconstructs clean images from significantly undersampled noisy inputs, usually at 1 sample per pixel as limited by current hardware's computing power. The state of the art reconstruction methods all rely on temporal filtering to find correspondences of current pixels in the previous frame, described using per‐pixel screen‐space motion vectors. While these approaches are demonstrated powerful, they suffer from a common issue that the temporal information cannot be used when the motion vectors are not valid, i.e. when temporal correspondences are not obviously available or do not exist in theory. We introduce temporally reliable motion vectors that aim at deeper exploration of temporal coherence, especially for the generally‐believed difficult applications on shadows, glossy reflections and occlusions, with the key idea to detect and track the cause of each effect. We show that our temporally reliable motion vectors produce significantly better temporal results on a variety of dynamic scenes when compared to the state of the art methods, but with negligible performance overhead.

Continuous shrinking of VLSI technology nodes brings us powerful chips with lower power consumption, but it also introduces many issues in manufacturability. Lithography simulation process for new feature size suffers from large computational overhead. As a result, conventional mask optimization process has been drastically resource consuming in terms of both time and cost. In this paper, we propose a high performance machine learning-based mask printability evaluation framework for lithography-related applications, and apply it in a conventional mask optimization tool to verify its effectiveness.

Recent advances in image super-resolution (SR) explored the power of deep learning to achieve a better reconstruction performance. However, the feedback mechanism, which commonly exists in human visual system, has not been fully exploited in existing deep learning based image SR methods. In this paper, we propose an image super-resolution feedback network (SRFBN) to refine low-level representations with high-level information. Specifically, we use hidden states in a recurrent neural network (RNN) with constraints to achieve such feedback manner. A feedback block is designed to handle the feedback connections and to generate powerful high-level representations. The proposed SRFBN comes with a strong early reconstruction ability and can create the final high-resolution image step by step. In addition, we introduce a curriculum learning strategy to make the network well suitable for more complicated tasks, where the low-resolution images are corrupted by multiple types of degradation. Extensive experimental results demonstrate the superiority of the proposed SRFBN in comparison with the state-of-the-art methods. Code is avaliable at https://github.com/Paper99/SRFBN_CVPR19.