In recent years, many advances have been made in the development of molecular scale devices. Experimental data shows that these devices have potential for use in both memory and logic. This article describes the challenges faced in building crossbar array-based molecular memory and develops a methodology to optimize molecular scale architectures based on experimental device data taken at room temperature. In particular, issues in reading and writing such as memory using CMOS are discussed, and a solution is introduced for easily reading device conductivity states (typically characterized by very small currents). Additionally, a metric is derived to determine the voltages for writing to the crossbar array. The proposed memory design is also simulated with consideration to device parameter variations. Thus, the results presented here shed light on important design choices to be made at multiple abstraction levels, from devices to architectures. Simulation results, incorporating experimental device data, are presented using Cadence Spectre.

In recent years many advances have been made in the development of molecular scale devices. Experimental data shows that these devices have potential for use in both memory and logic. This paper describes the challenges faced in building crossbar array based molecular memory, and develops a methodology to optimize molecular scale architectures based on experimental device data taken at room temperature. In particular, we discuss reading and writing such memory using CMOS and compiling a solution for easily reading device conductivity states (typically characterized by very small currents). Additionally, a metric is derived to determine the voltages for writing to the crossbar array. Simulation results, incorporating experimental device data, are presented using Cadence Spectre.

The use of strained layer epitaxy to grow high-quality Ge/sub x/Si/sub 1-x//Si heterostructures and their application to a wide range of heterostructure devices are addressed. The author reviews the mechanisms of strained layer growth, the bandstructure of the resulting material, and its use in test devices, including superlattice avalanche photodiodes for fiber optic communication, intrasubband optical detectors and arrays operating in the 10-15 mu m wavelength range, mobility enhanced modulation-doped transistors, heterojunction bipolar transistors with cutoff frequencies of 75 GHz, and negative resistance devices based on resonant tunneling and real-space carrier transfer.>