Demo Data from SIGIR 2026 / reviewers in the wild / expert
Bosui Liu
dblp:197/6565
· DBLP profile ↗
1ranked-venue papers
0as first author
0since 2021 · last 2017
—ORCID · none
Domains — the database's venue-derived domains; a paper can count in several
Applied, interdisciplinary, general and emerging computing · 1
Expertise — from the expertise taxonomy: the topics of the expert's papers under the CCF categories. A weight counts papers with recency: 1 for a paper about the topic, 0.3 when the topic is its context, halved every five years.
| Computer graphics and multimedia
1 paper |
Computational fabrication · 100% | |
| Computer networks
1 paper |
Physical-layer communications · 100% |
Topics — the 2 heaviest of 3, each with the papers that count most for it
| Topic | Weight | Papers | Last | Evidence papers |
|---|---|---|---|---|
Computational fabrication
additive manufacturing |
0.3 | 1 | 2017 | Laser-Based Layer-by-Layer Polymer Stereolithography for High-Frequency Applications · Proc. IEEE 2017 |
Computational fabrication › additive manufacturing
stereolithography |
0.3 | 1 | 2017 | Laser-Based Layer-by-Layer Polymer Stereolithography for High-Frequency Applications · Proc. IEEE 2017 |
Methods — techniques the papers use, named apart from their topics
laser-based layer-by-layer polymer stereolithography · 0.6
| Year | Publication | Venue | Position |
|---|---|---|---|
| 2017 | Laser-Based Layer-by-Layer Polymer Stereolithography for High-Frequency ApplicationsabstractIn this paper, a summary of works in creating truly three-dimensional structures for high-frequency applications will be presented using an additive manufacturing method, laser-based layer-by-layer polymer stereolithography. This polymer stereolithography is shown to have very good fabrication tolerances, which are necessary for making miniature RF components and narrow-band filters. The prototype components using this stereolithography include high-Q resonators, low-loss cavity filters and evanescent-mode filters, antennas, and miniature ion traps for mass spectrometry. Jeff Maas, Bosui Liu, Shloke Hajela, Yilei Huang, Xun Gong 0004, William J. Chappell |
Proc. IEEE | 2 |