Demo Data from SIGIR 2026 / reviewers in the wild / expert
Nariaki Ikeda
dblp:66/1009
· DBLP profile ↗
1ranked-venue papers
1as first author
0since 2021 · last 2010
—ORCID · none
Domains — the database's venue-derived domains; a paper can count in several
Applied, interdisciplinary, general and emerging computing · 1 · 1 first-author
Expertise — from the expertise taxonomy: the topics of the expert's papers under the CCF categories. A weight counts papers with recency: 1 for a paper about the topic, 0.3 when the topic is its context, halved every five years.
| Computer architecture, parallel and distributed computing, and storage systems
1 paper |
Integrated circuit design · 100% |
Topics — the 4 heaviest of 4, each with the papers that count most for it
| Topic | Weight | Papers | Last | Evidence papers |
|---|---|---|---|---|
Integrated circuit design › digital circuit design
gan transistor |
0.1 | 1 | 2010 | GaN Power Transistors on Si Substrates for Switching Applications · Proc. IEEE 2010 |
Integrated circuit design › semiconductor devices › heterostructure devices
heterojunction field-effect transistor |
0.1 | 1 | 2010 | GaN Power Transistors on Si Substrates for Switching Applications · Proc. IEEE 2010 |
Integrated circuit design
power semiconductor devices |
0.1 | 1 | 2010 | GaN Power Transistors on Si Substrates for Switching Applications · Proc. IEEE 2010 |
Integrated circuit design
power electronics |
0.0 | 1 | 2010 | GaN Power Transistors on Si Substrates for Switching Applications · Proc. IEEE 2010 |
| Year | Publication | Venue | Position |
|---|---|---|---|
| 2010 | GaN Power Transistors on Si Substrates for Switching ApplicationsabstractIn this paper, GaN power transistors on Si substrates for power switching application are reported. GaN heterojunction field-effect transistor (HFET) structure on Si is an important configuration in order to realize a low loss and high power devices as well as one of the cost-effective solutions. Current collapse phenomena are discussed for GaN-HFETs on Si substrate, resulting in suppression of the current collapse due to using the conducting Si substrate. Furthermore, attempts for normally off GaN-FETs were examined. A hybrid metal-oxide-semiconductor HFET structure is a promising candidate for obtaining devices with a lower on-resistance (Ron) and a high breakdown voltage (Vb). Nariaki Ikeda, Yuki Niiyama, Hiroshi Kambayashi, Yoshihiro Sato, Takehiko Nomura, Sadahiro Kato, Seikoh Yoshida |
Proc. IEEE | 1 |