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Pablo Royer Del Bario

dblp:130/1346 · DBLP profile ↗
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1ranked-venue papers
0as first author
0since 2021 · last 2013
—ORCID · none

Domains — the database's venue-derived domains; a paper can count in several

Systems, architecture and hardware · 1

Expertise — from the expertise taxonomy: the topics of the expert's papers under the CCF categories. A weight counts papers with recency: 1 for a paper about the topic, 0.3 when the topic is its context, halved every five years.

Computer architecture, parallel and distributed computing, and storage systems
1 paper
Electronic design automation · 72% Integrated circuit design · 28%

Topics — the 5 heaviest of 5, each with the papers that count most for it

TopicWeightPapersLastEvidence papers
Electronic design automation
design for manufacturability
0.212013
TEASE: a systematic analysis framework for early evaluation of FinFET-based advanced technology nodes · DAC 2013
Integrated circuit design
digital circuit design
0.212013
TEASE: a systematic analysis framework for early evaluation of FinFET-based advanced technology nodes · DAC 2013
Electronic design automation › design optimization
standard cell library optimization
0.212013
TEASE: a systematic analysis framework for early evaluation of FinFET-based advanced technology nodes · DAC 2013
Electronic design automation › design for manufacturability
lithography-aware design
0.012013
TEASE: a systematic analysis framework for early evaluation of FinFET-based advanced technology nodes · DAC 2013
Electronic design automation
physical design
0.012013
TEASE: a systematic analysis framework for early evaluation of FinFET-based advanced technology nodes · DAC 2013

Methods — techniques the papers use, named apart from their topics

lithography modeling · 0.2electrical constraint analysis · 0.2
YearPublicationVenuePosition
2013 TEASE: a systematic analysis framework for early evaluation of FinFET-based advanced technology nodes
abstract
This paper proposes TEASE (Technology Exploration and Analysis for SoC-level Evaluation), a framework to systematically analyze and evaluate system design in finFET-based technology node. The proposed framework combines both lithography and electrical constraints of a particular technology node to optimize the standard cell library performance. Growing complexity of logic design at nodes below 20nm causes to adopt a design style that can embrace the simplicity required to enable manufacturing, along with a process technology that can be finely tuned to the desired performance constraints. Additionally, the introduction of finFET based devices poses a new challenge for the designers to come up with an efficient standard cell template. The proposed framework can be used to detect the technology constraints that act as the bottleneck for the enablement of design at these advanced nodes. Results presented in this paper show by optimizing these bottlenecks we can improve the performance of a standard cell library significantly. Furthermore, adapting to such an analysis framework at an early stage of technology development helps to take the design constraints into the decision loop for realization of technology research into real products.
Arindam Mallik, Paul Zuber, Tsung-Te Liu, Bharani Chava, Bhavana Ballal, Pablo Royer Del Bario, Rogier Baert, Kris Croes, Julien Ryckaert, Mustafa Badaroglu, Abdelkarim Mercha, Diederik Verkest
DAC6