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Steven P. DenBaars

dblp:136/3750 · DBLP profile ↗
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1ranked-venue papers
1as first author
0since 2021 · last 1997
0000-0002-6612-5258ORCID · verified

Domains — the database's venue-derived domains; a paper can count in several

Applied, interdisciplinary, general and emerging computing · 1 · 1 first-author

Expertise — from the expertise taxonomy: the topics of the expert's papers under the CCF categories. A weight counts papers with recency: 1 for a paper about the topic, 0.3 when the topic is its context, halved every five years.

Computer architecture, parallel and distributed computing, and storage systems
1 paper
Integrated circuit design · 100%

Topics — the 2 heaviest of 2, each with the papers that count most for it

TopicWeightPapersLastEvidence papers
Integrated circuit design › optoelectronic devices
optoelectronic device design
0.011997
Gallium-nitride-based materials for blue to ultraviolet optoelectronics devices · Proc. IEEE 1997
Integrated circuit design › semiconductor device fabrication
semiconductor growth
0.011997
Gallium-nitride-based materials for blue to ultraviolet optoelectronics devices · Proc. IEEE 1997

Methods — techniques the papers use, named apart from their topics

thin-film deposition · 0.0materials characterization · 0.0
YearPublicationVenuePosition
1997 Gallium-nitride-based materials for blue to ultraviolet optoelectronics devices
abstract
Breakthroughs in materials growth have enabled extremely high-efficiency blue and green GaN light emitting diodes (LEDs) to be achieved for the first time. Blue LEDs with external quantum efficiency exceeding 9% have enabled hybrid GaN/phosphor white lamp LEDs. GaN LEDs complete the primary color spectrum and have enabled bright and reliable full-color solid-state displays to be realized. Recently, room-temperature operation of continuous wave current-injection blue-violet lasers emitting at 417 nm has further increased the possible applications for GaN-based opto-electronic devices. In this paper, we review the key technologies for GaN-based materials and devices. Developments in the methods for thin-film deposition by metalorganic chemical vapor deposition and molecular beam epitaxy and resulting film properties are highlighted.
Steven P. DenBaars
Proc. IEEE1