Interconnect issues are becoming increasingly important for ULSI systems. IntSim, an interconnect CAD tool, has been developed to obtain pitches of different wiring levels and die size for circuit blocks or logic cores of microchips. It includes a methodology for co-optimization of signal, power and clock interconnects, and a newly derived stochastic wiring distribution that gives reduced error than prior work when compared to measured data. Results of IntSim are found to match well with actual data from an analyzed microprocessor. Several case studies are conducted to show this CAD tool’s utility as a system level simulator: (i) Wire resistivity increases due to size effects are projected to increase die size of a 22nm low power logic core by 30% and power by 7%. (ii) When compared to a 22nm low power logic core with copper interconnects, a similar logic core with carbon nanotube interconnects could reduce power by 25% and die area by 27%, or increase frequency by 15% and reduce die area by 11%. (iii) A future 22nm 8 GHz 96M gate logic core’s power, die size and optimal multilevel interconnect architecture are predicted. A version of IntSim with a graphical user interface is available for download from www.ece.gatech.edu/research/labs/gsigroup.

Every new VLSI technology generation has resulted in interconnects increasingly limiting the performance, area, and power dissipation of new processors. Subsequently, it is necessary to devise efficient interconnect design techniques to reduce the impact of VLSI interconnects on overall system design. New optimizations of a wave-pipelined multiplexed (WPM) interconnect routing circuit are described in this paper. These WPM circuits can be used with current interconnect repeater circuits to further reduce interconnect delay, interconnect area, transistor area, and/or power dissipation. For example, new area constrained WPM circuit optimizations illustrate that the interconnect circuit power can be reduced by 26% or the interconnect performance can be improved by 74%. Moreover, in both these cases, because a significant number of repeaters are eliminated, the transistor area can reduce by 41% or 29%, respectively. Finally, the tolerance of WPM circuits to crosstalk noise, power supply noise, clock skew, and manufacturing variations is also presented. This study of tolerance levels defines the conditions under which the WPM circuit will function correctly, and it is shown in this paper for the first time that WPM circuits are robust enough to operate with variability that can be encountered in deep submicrometer technologies.

This paper shows the decreased effectiveness of on-chip decoupling capacitance in high-frequency operation. On-chip decoupling capacitance is often used to decrease the variation of the propagation delay caused by power/ground noise, i.e., dynamic IR-drop and/or delta-I noise. However, it is shown in this paper that decoupling capacitance is only effective for coping with dynamic IR-drop if the recharging time between switching events is sufficient. In other words, the effectiveness of decoupling capacitance for dynamic IR-drop in high-frequency operation is less than that of a fully-charged decoupling capacitor. The recharging time and the effectiveness of a decoupling capacitor depend on the propagation delay of the average circuit path which is used to determine the total switching current of a given macro/chip and clock cycle time. If the propagation delay of the critical paths is approximately equal to that of the average circuit path, then it is shown in this paper that adding decoupling capacitance never improves the maximum frequency of the system due to dynamic IR-drop limitations. On the other hand, if the propagation delay of the critical paths is larger than that of the average circuit path, then the maximum frequency is improved by adding decoupling capacitance. In both cases, a new metric, called the apparent capacitance, can be used to help make correct decisions about decoupling capacitance planning.

The ever-increasing number of transistors on a chip has resulted in very large scale integration (VLSI) systems whose performance and manufacturing costs are driven by on-chip wiring needs. This paper proposes a low overhead wave-pipelined two-slot time division multiplexed (WP/2-TDM) routing technique that harnesses the inherent intra-clock period wire idleness to implement wire sharing in combination with wave-pipelined circuit techniques. It is illustrated in this paper that WP/2-TDM routing can be readily incorporated into future gigascale integration (GSI) systems to reduce the number of interconnect routing channels in an attempt to contain escalating manufacturing costs. Two case studies, one at the circuit level and one at the system level, are presented to illustrate the advantages of WP/2-TDM routing. The circuit level implementation exhibits more than 40 % reduction in wire area, a 30 % reduction in silicon area with no increase in dynamic power and no loss of throughput performance.

The technique of optimal voltage scaling and repeater insertion is analyzed in this paper to reduce power dissipation on global interconnects. An analytical model for the maximum bit-rate of a very large scale integration interconnect with repeaters has been derived and results are compared with HSPICE simulations. The analytical model is also used to study the effects of interconnect length and scaling on throughput. The throughput-per-bit-energy is analyzed to determine an optimum combination of supply voltage and repeaters for a low-power global interconnect with 250 nm /spl times/ 250 nm cross-sectional dimensions implemented with the 180 nm micro-optical silicon system technology node. It is shown that the optimal supply voltage is approximately equal to twice the threshold voltage. A case study illustrates that a combination of 1 V supply along with one repeater per millimeter increases the throughput-per-bit-energy to over three times that of a latency-centric interconnect of 2 V, which results in a 70% reduction in power dissipation without any loss of throughput performance.

In modern-day VLSI systems, performance and manufacturing costs are being driven by the on-chip wiring needs due to the continuous increase in the number of transistors. This paper proposes a low overhead wave-pipelined multiplexed (WPM) routing technique that harnesses the inherent intraclock period interconnect idleness to implement wire sharing throughout the various hierarchical levels of design. It is illustrated in this paper that the WPM network can be readily incorporated into future gigascale integration (GSI) systems to reduce the number of interconnect routing channels in an attempt to contain escalating manufacturing costs. Both, a system level analysis and circuit level verification of this WPM routing are presented in this paper. A multilevel interconnect network design simulator (MINDS) that uses system level interconnect prediction (SLIP) techniques and HSPICE circuit simulations for optimizing the interconnect dimensions has been used to assess the opportunities for application of WPM wire circuits in high performance digital designs. A custom routing example highlights the ease with which the WPM routing technique can be easily incorporated into the existing VLSI systems. In addition, for a 40 million transistor system case study, this system level analysis reveals that the use of a WPM network could result in an almost 20% decrease in the number of metal layers for less than 4% increase in dynamic power with no loss of communication throughput performance. The key virtues of WPM routing are its flexibility, robustness, implementation simplicity and its low overhead requirements.

Rapid approximation of the transient response of high-speed global interconnects is needed to estimate the time delay, crosstalk, and overshoot in a GSI multilevel wiring network. This paper outlines a rigorous and physical solution for transients in a capacitively-loaded distributed rlc interconnect using a convergent series of modified Bessel functions. Compact models for time delay and repeater insertion are derived. The single-line model is extended to evaluate crosstalk in two-coupled lines. These solutions are validated by HSPICE simulation, and have potential applications to rapid rlc timing analysis, global wire sizing and repeater insertion, signal integrity estimation, and reliability modeling (e.g. voltage overshoot and high current density concerns).

An interconnect distribution model for homogeneous, three-dimensional (3-D) architectures with variable separation of strata is presented. Three-dimensional architectures offer an opportunity to reduce the length of the longest interconnects. The separation of strata has little impact on the length of interconnects but a large impact on the number of interstratal interconnects. Using a multilevel interconnect methodology for an ITRS 2005 100 nm ASIC, a two-strata architecture offers a 3.9/spl times/ increase in wire-limited clock frequency, an 84% decrease in wire-limited area or a 25% decrease in the number of metal levels required. In practice, however, such fabrication advances as improved alignment tolerances in wafer-bonding techniques are needed to gain key advantages stemming from 3-D architectures for homogeneous gigascale integrated circuits.

A multilevel interconnect architecture design methodology that optimizes the interconnect cross-sectional dimensions of each metal layer is introduced that reduces logic macrocell area, cycle time, power consumption or number of metal layers. The predictive capability of this methodology, which is based on a stochastic wiring distribution, provides insight into defining the process technology parameters for current and future generations of microprocessors and application-specific integrated circuits (ASICs). Using this methodology on an ASIC logic macrocell case study for the 100 nm technology generation, the optimized n-tier multilevel interconnect architecture reduces macrocell area by 32%, cycle time by 16% or number of wiring tracks required on the topmost tier by 62% compared to a conventional design where pitches are doubled for every successive pair of levels. A new repeater insertion methodology is also described that further enhances gigascale integration (GSI) system performance. By using repeaters, a further reduction of 70% in macrocell area, 18% in cycle time, 25% in number of metal levels or 44% in power dissipation is achieved, when compared to an n-tier design without repeaters. The key distinguishing feature of the methodology is its comprehensive framework that simultaneously solves two distinct problems-optimal wire sizing and wiring layer assignment-using independent constraints on maximum repeater area for efficient design space exploration to optimize the area, power, frequency, and metal levels of a GSI logic megacell.

Minimum power CMOS ASIC macrocells are designed by minimizing the macrocell area using a new methodology to optimally insert repeaters for n-tier multilevel interconnect architectures. The minimum macrocell area and power dissipation are projected for the 100, 70 and 50 nm technology generations and compared with a n-tier design without using repeaters. Repeater insertion and a novel interconnect geometry scaling technique decrease the power dissipation by 58-68% corresponding to a macrocell area reduction of 70-78% for the global clock frequency designs of these three technology generations.

Via blockage due to signal interconnects and its impact on wirability of multi-billion-transistor chips are systematically analyzed. Via classifications are introduced. By taking advantage of a stochastic interconnect length distribution and a multi-level interconnect network architecture, a physical via blockage model exploiting channel availability is proposed. This model reveals that the most severe via blockage occurs on first metal level, wasting more than 10% and up to about 50% of wiring area. A new perspective on chip size limit imposed by via blockage is also provided by using the proposed model.

A system-on-a-chip (SoC) contains several pre-designed heterogeneous megacells that have been designed and routed optimally. In this paper a new stochastic net-length distribution for global interconnects in a nonhomogeneous SoC is derived using novel models for netlist, placement, and routing information. The netlist information is rigorously derived based on heterogeneous Rent's rule, the placement information is modeled by assuming a random placement of terminals for a given net in a bounding area, and the routing information is constructed based on a new model for minimum rectilinear Steiner tree construction (MRST). The combination of the three models gives a priori estimation of global net-length distribution in a heterogeneous SoC. Unlike previous models that empirically relate the average length of the global wires to the chip area, the new distribution provides a complete and accurate distribution of net-length for global interconnects. Through comparison with actual product data, it is shown that the new stochastic model successfully predicts the global net-length distribution of a heterogeneous system.