Shayesteh Masoumian

dblp:206/1177 · DBLP profile ↗
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5ranked-venue papers
4as first author
3since 2021 · last 2025
—ORCID · none

Domains — the database's venue-derived domains; a paper can count in several

Systems, architecture and hardware · 5 · 4 first-author · 3 since 2021Software engineering, systems software and programming languages · 1 · 1 first-author · 1 since 2021
YearPublicationVenuePosition
2025 Modeling and Analysis of Aging Impact on SRAM PUFs for Advanced FinFET Technology Nodes
Shayesteh Masoumian, Roel Maes, Noemie Beringuier-Boher, Karthik Keni Yerriswamy, Geert Jan Schrijen, Said Hamdioui, Mottaqiallah Taouil
ETS1
2023 Modeling and Analysis of SRAM PUF Bias Patterns in 14nm and 7nm FinFET Technology Nodes
abstract
SRAM Physical Unclonable Functions (PUFs) are one of the popular forms of PUFs that can be used to generate unique identifiers and randomness for security purposes. Hence, their resilience to attacks is crucial. The probability of attacks increases when the SRAM PUF start-up values follow a predictable pattern which we refer to as bias. In this paper, we investigate the parameters impacting the SRAM PUF bias of advanced FinFET SRAM designs. In particular, we analyze the bias with respect to temperature, mismatches in the power supply network, and ramp-up time. We also consider process variation, circuit noise, and SRAM layout in our analysis. Our simulations results match with the silicon measurements. From the experiments we conclude that (i) the SRAM layout and in particular the power supply network can lead to a bias, (ii) this bias increases with temperature, and (iii) this bias increases when the supply ramp-up time decreases.
Shayesteh Masoumian, Roel Maes, Karthik Keni Yerriswamy, Geert Jan Schrijen, Said Hamdioui, Mottaqiallah Taouil
VLSI-SoC1
2022 Reliability Analysis of FinFET-Based SRAM PUFs for 16nm, 14nm, and 7nm Technology Nodes
abstract
SRAM Physical Unclonable Functions (PUFs) are among other things today commercially used for secure primitives such as key generation and authentication. The quality of the PUFs and hence the security primitives, depends on intrinsic variations which are technology dependent. Therefore, to sustain the commercial usage of PUFs for cutting-edge technologies, it is important to properly model and evaluate their reliability. In this work, we evaluate the SRAM PUF reliability using within class Hamming distance (WCHD) for 16nm, 14nm, and 7nm using simulations and silicon validation for both low-power and high-performance designs. The results show that our simulation models and expectations match with the silicon measurements. From the experiments, we conclude the following: (1) SRAM PUF is reliable in advanced FinFET technology nodes, i.e., the noise is low in 16nm, 14nm, and 7nm, (2) temperature variations have a marginal impact on the reliability, and (3) both low-power and high-performance SRAMs can be used as a PUF without excessive need of error correcting codes (ECCs).
Shayesteh Masoumian, Georgios N. Selimis, Geert Jan Schrijen, Said Hamdioui, Mottaqiallah Taouil
DATE1
2020 Modeling Static Noise Margin for FinFET based SRAM PUFs
abstract
In this paper, we develop an analytical PUF model based on a compact FinFET transistor model that calculates the PUF stability (i.e. PUF static noise margin (PSNM)) for FinFET based SRAMs. The model enables a quick design space exploration and may be used to identify critical parameters that affect the PSNM. The analytical model is validated with SPICE simulations. In our experiments, we analyze the impact of process variation, technology, and temperature on the PSNM. The results show that the analytical model matches very well with the simulation model. From the experiments we conclude the following: (1) nFET variations have a larger impact on the PSNM than pFET (1.5% higher PSNM in nFET variations than pFET variations at 25°C), (2) high performance SRAM cells are more skewed (1.3% higher PSNM) (3) the reproducibility increases with smaller technology nodes (0.8% PSNM increase from 20 to 14 nm) (4) increasing the temperature from −10°C to 120°C leads to a PSNM change of approximately 1.0% for an extreme nFET channel length.
Shayesteh Masoumian, Georgios N. Selimis, Roel Maes, Geert Jan Schrijen, Said Hamdioui, Mottaqiallah Taouil
ETS1
2017 Synchoricity and NOCs could make Billion Gate Custom Hardware Centric SOCs Affordable
abstract
In this paper, we present a novel synchoros VLSI design scheme that discretizes space uniformly. Synchoros derives from the Greek word chóros for space. We propose raising the physical design abstraction to register transfer level by using coarse grain reconfigurable building blocks called SiLago blocks. SiLago blocks are hardened, synchoros and are used to create arbitrarily complex VLSI design instances by abutting them and not requiring any further logic and physical syntheses. SiLago blocks are interconnected by two levels of NOCs, regional and global. By configuring the SiLago blocks and the two levels of NOCs, it is possible to create implementation alternatives whose cost metrics can be evaluated with agility and post layout accuracy. This framework, called the SiLago framework includes a synthesis based design flow that allows end to end automation of multi-million gate functionality modeled as SDF in Simulink to be transformed into timing and DRC clean physical design in minutes, while exploring 100s of solutions. We benchmark the synthesis efficiency, and silicon and computational efficiencies against the conventional standard cell based tooling to show two orders improvement in accuracy and three orders improvement in synthesis while eliminating the need to verify at lower abstractions like RTL. The proposed solution is being extended to deal with system-level non-compile time functionalities. We also present arguments on how synchoricity could also contribute to eliminating the engineering cost of designing masks to lower the manufacturing cost.
Ahmed Hemani, Syed M. A. H. Jafri, Shayesteh Masoumian
NOCS3