EDBT 2026 Demo / reviewers in the wild / expert
Haoxiang Jiang
dblp:303/7599
· DBLP profile ↗
2ranked-venue papers
0as first author
2since 2021 · last 2026
—ORCID · conflict
Domains — the database's venue-derived domains; a paper can count in several
Artificial intelligence and machine learning · 1 · 1 since 2021Systems, architecture and hardware · 1 · 1 since 2021Databases, data management, data science and information retrieval · 1 · 1 since 2021
Expertise — from the expertise taxonomy: the topics of the expert's papers under the CCF categories. A weight counts papers with recency: 1 for a paper about the topic, 0.3 when the topic is its context, halved every five years.
| Artificial intelligence
1 paper |
Efficient and distributed learning · 50% Transfer learning and domain adaptation · 50% | |
| Computer architecture, parallel and distributed computing, and storage systems
1 paper |
Electronic design automation · 100% |
Topics — the 4 heaviest of 4, each with the papers that count most for it
| Topic | Weight | Papers | Last | Evidence papers |
|---|---|---|---|---|
Machine learning › Transfer learning and domain adaptation
foundation model adaptation |
1.0 | 1 | 2026 | PEANuT: Parameter-Efficient Adaptation with Weight-aware Neural Tweakers · KDD (1) 2026 |
Machine learning › Efficient and distributed learning
parameter-efficient fine-tuning |
1.0 | 1 | 2026 | PEANuT: Parameter-Efficient Adaptation with Weight-aware Neural Tweakers · KDD (1) 2026 |
Electronic design automation › physical design › optical proximity correction
inverse lithography technology |
0.9 | 1 | 2025 | SSDL-ILT: Efficient ILT utilizing a self-supervised deep learning model · DAC 2025 |
Electronic design automation › physical design › optical proximity correction
subresolution assist feature generation |
0.9 | 1 | 2025 | SSDL-ILT: Efficient ILT utilizing a self-supervised deep learning model · DAC 2025 |
Methods — techniques the papers use, named apart from their topics
neural tweaker modules · 1.0low-rank adaptation · 1.0self-supervised deep learning · 0.9few-shot learning · 0.9
| Year | Publication | Venue | Position |
|---|---|---|---|
| 2026 | PEANuT: Parameter-Efficient Adaptation with Weight-aware Neural TweakersabstractFine-tuning large pre-trained foundation models often yields excellent downstream performance but is prohibitively expensive when updating all parameters. Parameter-efficient fine-tuning (PEFT) methods such as LoRA alleviate this by introducing lightweight update modules, yet they commonly rely on weight-agnostic linear approximations, limiting their expressiveness. In this work, we propose PEANuT, a novel PEFT framework that introduces weight-aware neural tweakers, compact neural modules that generate task-adaptive updates conditioned on frozen pre-trained weights. PEANuT provides a flexible yet efficient way to capture complex update patterns without full model tuning. We theoretically show that PEANuT achieves equivalent or greater expressivity than existing linear PEFT methods with comparable or fewer parameters. Extensive experiments across four benchmarks with over twenty datasets demonstrate that PEANuT consistently outperforms strong baselines in both NLP and vision tasks, while maintaining low computational overhead. Yibo Zhong, Haoxiang Jiang, Lincan Li, Ryumei Nakada, Tianci Liu 0003, Linjun Zhang, Huaxiu Yao, Haoyu Wang 0004 |
KDD (1) | 2 |
| 2025 | SSDL-ILT: Efficient ILT utilizing a self-supervised deep learning modelabstractInverse lithography technology (ILT) is an advanced resolution enhancement technique that achieves mask optimization at the pixel level. However, application of ILT is hindered by time-intensive physical simulation. Herein, we propose an efficient ILT algorithm leveraging a deep learning model. A novel loss function is constructed to guide the model training in a self-supervised manner, eliminating the requirement of labelled data that might be nontrivial to acquire. The trained model outputs final mask patterns without further ILT optimization. Sub-resolution assist features (SRAFs) are generated automatically, the complexity of which can be adjusted during the training process to control mask manufacturability. The model was trained and validated on ICCAD-2013 CAD contest dataset. Better pattern fidelity and up to 12,000 times speedup are observed compared to other SOTA models. The trained model also shows good generalization ability to geometrically-different design patterns from another dataset, via a few-shot learning approach. Junqi Yang, Haoxiang Jiang |
DAC | 3 |