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Anna Maria Eggler

dblp:390/5708 · DBLP profile ↗
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2ranked-venue papers
2as first author
2since 2021 · last 2025
0009-0002-0107-5461ORCID · corroborated

Domains — the database's venue-derived domains; a paper can count in several

Graphics, computer vision, multimedia, augmented reality and games · 2 · 2 first-author · 2 since 2021Human-computer interaction and ubiquitous computing · 1 · 1 first-author · 1 since 2021

Expertise — from the expertise taxonomy: the topics of the expert's papers under the CCF categories. A weight counts papers with recency: 1 for a paper about the topic, 0.3 when the topic is its context, halved every five years.

Computer graphics and multimedia
1 paper
Geometric modeling and processing · 100%

Topics — the 2 heaviest of 2, each with the papers that count most for it

TopicWeightPapersLastEvidence papers
Geometric modeling and processing › surface fitting
developable surface approximation
0.912025
Designing with Tension: Nearly-Developable Patch Layouts · SIGGRAPH Asia 2025
Geometric modeling and processing
surface fitting
0.912025
Designing with Tension: Nearly-Developable Patch Layouts · SIGGRAPH Asia 2025

Methods — techniques the papers use, named apart from their topics

curvature field · 0.9combinatorial optimization · 0.9
YearPublicationVenuePosition
2025 Designing with Tension: Nearly-Developable Patch Layouts
abstract
We propose a novel method to automatically approximate a free-form surface using a set of near developable patches that form a tensile-like structure when anchored at a sparse set of points. These structures are appealing for their ability to span large areas with low material cost and structural weight, while also offering strong aesthetic potential. Our algorithm strikes a balance between approximation accuracy, patch simplicity, and visual quality, while ensuring manufacturability and structural feasibility. The layout is guided by a curvature field and refined through a combinatorial process that incrementally adds patches until performance and fabrication constraints are met. Redundant elements are then removed to improve clarity and elegance.
Anna Maria Eggler, Nico Pietroni, Pengbin Tang, Michal Piovarci, Bernd Bickel
SIGGRAPH Asia1
2024 Digital Garment Alteration
abstract
Abstract Garment alteration is a practical technique to adapt an existing garment to fit a target body shape. Typically executed by skilled tailors, this process involves a series of strategic fabric operations—removing or adding material—to achieve the desired fit on a target body. We propose an innovative approach to automate this process by computing a set of practically feasible modifications that adapt an existing garment to fit a different body shape. We first assess the garment's fit on a reference body; then, we replicate this fit on the target by deriving a set of pattern modifications via a linear program. We compute these alterations by employing an iterative process that alternates between global geometric optimization and physical simulation. Our method utilizes geometry‐based simulation of woven fabric's anisotropic behavior, accounts for tailoring details like seam matching, and incorporates elements such as darts or gussets. We validate our technique by producing digital and physical garments, demonstrating practical and achievable alterations.
Anna Maria Eggler, Raphael Falque, Mark Liu, Teresa Vidal-Calleja, Olga Sorkine-Hornung, Nico Pietroni
Comput. Graph. Forum1