In this paper, a method is proposed for extraction of coupled networks from layout information for simulation of electrothermal device behavior. The networks represent a three-dimensional (3-D) device structure with circuit elements. The electrical and thermal characteristics of this circuit representation are calculated with a circuit simulator. Spatial potential distributions, current flows, and temperature distributions in the device structure are calculated on the spatial coordinates. This simulation method can be placed between device simulation and (conventional) circuit simulation. It has been implemented in a circuit simulator and is demonstrated for simulation of self-heating in a bipolar low frequency power transistor. The main advantage of this simulation method is that not only the 3-D thermal behavior of the whole chip is simulated, but that this is also directly coupled to the electrical device behavior by means of the power dissipation and temperature distribution in the device. This offers the possibility for the circuit designer to simulate 3-D, coupled, thermal-electrical problems with a circuit simulator. As an example, the influence of the emitter contacting on the internal temperature and current distribution of a BJT is investigated.

The electrical characteristics of modern VLSI and ULSI device structures may be significantly altered by self-heating effects. The device modeling of such structures demands the simultaneous simulation of both the electrical and the thermal device behavior and their mutual interaction. Although, at present, a large number of multi-dimensional device simulators are available, most of them are based on physical models which do not properly allow for heat transport and other nonisothermal effects. This paper, demonstrates that the numerical process/device simulator TRENDY provides a solid base for nonisothermal device simulation, as a physically rigorous device model of carrier and heat transport has been incorporated in the TRENDY program. With respect to the boundary conditions, it is shown that inclusion of an artificial boundary material relaxes some fundamental physical inconsistencies resulting from the assumption of ideal ohmic contact boundaries. The program TRENDY has been used for studying several nonisothermal problems in microelectronics. As an example, the authors consider an ultra-thin SOI MOSFET showing that the negative slopes in the V/sub ds//spl minus/I/sub ds/ characteristics are caused by the temperature-dependence of the electron saturation velocity.>