Design objectives of robustness and low-power usually do not go hand in hand with the test objectives of maximum test coverage and minimum test cost. Low power robust design techniques such as dual-Vth, dual-VDD, or adaptive body biasing have negative impact on the associated test cost. Similarly, test techniques like enhanced scan have large overhead in terms of area and power. In this paper, we try to mitigate the conflicting design and test requirements using an integrated approach to design and test that utilizes the existing low power and error resilient design techniques and augments them to improve test coverage and cost. Simulation results on an example 8×8 Wallace tree multiplier in 90nm technology node show 20% reduction in operating power, 60% reduction in test power and 99% reduction in critical paths while at the same time improving the yield from 96% to 100%, compared to existing design and test methodologies. All this comes at the cost of a marginal increase in area (7.8%).

In scaled technologies, cache memories which are traditionally known as “cold” sections of the chip are expected to occupy a larger die area. Hence, different sections of a cache memory may experience different temperature profiles depending on their proximity to the active logic units such as the execution unit. In this paper, we performed thermal analysis of cache memories under the influence of hot-spots. In particular, 6-transistor (T) static random access memory (SRAM), 8-T SRAM, and embedded dynamic random access memory (eDRAM) cache memories were investigated. Thermal maps of the entire caches were generated using hierarchical compact thermal models while solving the leakage and temperature self-consistently. The 6-T and the 8-T SRAM bitcells were investigated in terms of stability, noise immunity, and performance under temperature variations for various technology nodes. The 3-T micro sense amplifier used in eDRAM cache memories was investigated for its robustness. Thermal-aware circuit design techniques were explored to improve cache stability under thermal gradients. Results show that, for all cache memories, spatial temperature variations have to be considered to achieve the optimal memory design.

Strong temperature dependence of leakage has been a major problem during burn-in test where increased voltages and temperatures are applied to weed out defective parts. Moreover, process variations may result in different temperature profiles in different dies during burn-in. This paper proposes an adaptive design-for-burn-in technique that stabilizes the junction temperature by controlling the leakage power using sleep (supply-gating) transistors for a wide range of ambient temperatures, process variations, thermal resistances and supply voltages.

Different sections of a cache memory may experience different temperature profiles depending on their proximity to other active logic units such as the execution unit. In this paper, we perform thermal analysis of cache memories under the influence of hot-spots. In particular, 8-T SRAM bit cell is chosen because of its robust functionality at nano-scaled technologies. Thermal map of entire 8-T SRAM cache is generated using hierarchical compact thermal models while solving the leakage and temperature self consistently. The impact of spatial temperature variations on 8T-SRAM parameters such as local bitline (LBL) sensing delay, noise robustness and bitcell stability are evaluated for 45nm/32nm/22nm bulk CMOS technology nodes. The effectiveness of variable keeper sizing on LBL sensing delay is analyzed. It is predicted that at 22 nm node, the leakage induced temperature rise has severe effects on the 8-T SRAM characteristics.

In this paper, we propose a methodology to solve leakage power self-consistently with temperature to predict thermal runaway. We target 28-nm-technology-node FinFET-based circuits as they are more prone to thermal runaway because of self-heating and less efficient heat dissipation compared to bulk metal-oxide-semiconductor field-effect transistors. We have generated thermal models for logic cells-inverter, NAND, and NOR-to self-consistently determine the temperature map of a circuit block. Our cell-level thermal models account for lateral heat flow (contribution of neighboring cells) along with vertical heat dissipation to the heat sink. We predict positive feedback between subthreshold leakage and temperature for all the cells in a given floor plan. Our proposed condition for thermal runaway shows the design tradeoff between the primary input (PI) activity of a circuit block, subthreshold leakage at the room temperature, and thermal resistance of the package. We show that, in FinFET circuits, thermal runaway can occur at the International Technology Roadmap for Semiconductors-specified subthreshold leakage (of 150 for high performance) for a nominal PI activity of 0.5 and typical package thermal resistance. In addition, we show that the maximum temperature rise in an integrated circuit is limited by package limitations.

With technology scaling, elevated temperatures caused by increased power density create a critical bottleneck modulating the circuit operation. With the advent of FinFET technologies, cooling of a circuit is becoming a bigger challenge because of the thick buried oxide inhibiting the heat flow to the heat sink and confined ultra-thin channel increasing the thermal resistivity. In this work, we propose compact thermal models to predict the temperature rise in FinFET structures. We develop cell-level compact thermal models for standard INV, NAND and NOR gates accounting for the heat transfer across the six faces of a cell. Temperature maps of benchmark circuits exhibit close correspondence with dynamic power maps because of confined regions of heat generation separated by low thermal conductivity material. It is illustrated that temperature-aware timing analysis is imperative, because of high inter-cell temperature gradient. Accurate prediction of temperature in the early phase of design cycle gives valuable estimation of power/performance/reliability of a circuit block and guides in the design of more robust circuits.

In this work we propose a methodology to self-consistently solve leakage power with temperature to predict thermal runaway. We target 28n m FinFET based circuits as they are more prone to thermal runaway compared to bulk-MOSFETs. We generate thermal models for logic cells to self-consistently determine the temperature map of a circuit block. Our proposed condition for thermal runaway shows the design trade off between the primary input (PI) activity of a circuit block, sub-threshold leakage at the room temperature and the thermal resistance of the package. We show that in FinFET circuits, thermal runaway can occur at the ITRS specified sub-threshold leakage (150nA/μm, highperformance) for a nominal PI activity of 0.5 and typical package thermal resistance.

Increase in leakage current with technology scaling has been a major problem for IC technology. This problem becomes more crucial during burn-in test where stressed voltage and temperature are applied. Due to presence of a positive feedback between major components of leakage and temperature in CMOS circuits, excessive leakage may lead to thermal runaway and yield loss during burn-in test. This paper describes a novel integrated leakage control system to ensure thermal stability during burn-in test for a wide range of ambient temperatures and process variations