After decades of continuous scaling, further advancement of silicon microelectronics across the entire spectrum of computing applications is today limited by power dissipation. While the trade-off between power and performance is well-recognized, most recent studies focus on the extreme ends of this balance. By concentrating instead on an intermediate range, an ~ 8× improvement in power efficiency can be attained without system performance loss in parallelizable applications-those in which such efficiency is most critical. It is argued that power-efficient hardware is fundamentally limited by voltage scaling, which can be achieved only by blurring the boundaries between devices, circuits, and systems and cannot be realized by addressing any one area alone. By simultaneously considering all three perspectives, the major issues involved in improving power efficiency in light of performance and area constraints are identified. Solutions for the critical elements of a practical computing system are discussed, including the underlying logic device, associated cache memory, off-chip interconnect, and power delivery system. The IBM Blue Gene system is then presented as a case study to exemplify several proposed directions. Going forward, further power reduction may demand radical changes in device technologies and computer architecture; hence, a few such promising methods are briefly considered.

This paper presents the current state of understanding of the factors that limit the continued scaling of Si complementary metal-oxide-semiconductor (CMOS) technology and provides an analysis of the ways in which application-related considerations enter into the determination of these limits. The physical origins of these limits are primarily in the tunneling currents, which leak through the various barriers in a MOS field-effect transistor (MOSFET) when it becomes very small, and in the thermally generated subthreshold currents. The dependence of these leakages on MOSFET geometry and structure is discussed along with design criteria for minimizing short-channel effects and other issues related to scaling. Scaling limits due to these leakage currents arise from application constraints related to power consumption and circuit functionality. We describe how these constraints work out for some of the most important application classes: dynamic random access memory (DRAM), static random access memory (SRAM), low-power portable devices, and moderate and high-performance CMOS logic. As a summary, we provide a table of our estimates of the scaling limits for various applications and device types. The end result is that there is no single end point for scaling, but that instead there are many end points, each optimally adapted to its particular applications.

This paper considers the design, fabrication, and characterization of very small MOSFET switching devices suitable for digital integrated circuits using dimensions of the order of 1 .Scaling relationships are presented which show how a conventional MOS-FET can be reduced in size.An improved small device structure is presented that uses ion implantation to provide shallow source and drain regions and a nonuniform substrate doping profile.Onedimensional models are used to predict the substrate doping profile and the corresponding threshold voltage versus source voltage characteristic.A two-dimensional current transport model is used to predict the relative degree of short-channel effects for different device parameter combinations.Polysilicon-gate MOSFET's with channel lengths as short as 0.5 were fabricated, and the device characteristics measured and compared with predicted values.The performance improvement expected from using these very small devices in highly miniaturized integrated circuits is projected. I. LIST OF SYMBOLSInverse semilogarithmic slope of subthreshold characteristic.Width of idealized step function profile for channel implant.Work function difference between gate and substrate.Dielectric constants for silicon and silicon dioxide.Drain current.Boltzmann's constant.Unitless scaling constant.MOSFET channel length.Effective surface mobility.Intrinsic carrier concentration.Substrate acceptor concentration.Band bending in silicon at the onset of strong inversion for zero substrate voltage.Built-in junction potential.

While technology is changing the face of the world, it itself is changing by leaps and bounds; there is a continuing trend to put more functionality on the same piece of silicon. Without major changes in the CMOS technology, it has been shown that the scaling of devices has significant impact on the effectiveness of Iddq testing. The sensitivity of Iddq testing to individual device parameters is studied. It is explained how Iddq testing becomes increasingly ineffective in the scaled product with respect to most parameters and can be improved with others.

A guideline for scaling of CMOS technology for logic applications such as microprocessors is presented covering the next ten years, assuming that the lithography and base process development driven by DRAM continues on the same three-year cycle as in the past. This paper emphasizes the importance of optimizing the choice of power-supply voltage. Two CMOS device and voltage scaling scenarios are described. One optimized for highest speed and the other trading off speed improvement for much lower power. It is shown that the low power scenario is quite close to the original constant electric-field scaling theory. CMOS technologies ranging from 0.25 /spl mu/m channel length at 2.5 V down to sub-0.1 /spl mu/m at 1 V are presented and power density is compared for the two scenarios. Scaling of the threshold voltage along with the power supply voltage will lead to a substantial rise in standby power compared to active power and some tradeoffs of performance and/or changes in design methods must be made. Key technology elements and their impact on scaling are discussed. It is shown that a speed improvement of about 7/spl times/ and over two orders of magnitude improvement in power-delay product (mW/MIPS) are expected by scaling of bulk CMOS down to the sub-0.1 /spl mu/m regime as compared with today's high performance 0.6 /spl mu/m devices at 5 V. However, the power density rises by a factor of 4/spl times/ for the high-speed scenario. The status of the silicon-on-insulator (SOI) approach to scaled CMOS is also reviewed, showing the potential for about 3/spl times/ savings in power compared to the bulk case at the same speed.>