PSP and the backward propagation of variance (BPV) method are used to characterize the statistical variations of metal-oxide-semiconductor field effect transistors (MOSFETs). BPV statistical modeling of NMOS and PMOS devices is, for the first time, coupled by including self-consistent modeling of ring oscillator gate delays. Parasitic capacitances are included in the analysis. The proposed technique is validated using Monte-Carlo simulations and by comparison to experimental data from two technologies.

An engineering model of the short-channel NMOS transistor which is applicable to both room-temperature and cryogenic device operation is presented. The model incorporates the nonuniversal dependence of the effective channel mobility on the effective vertical field, which is ignored in room-temperature device models. Described also is a novel method to account for the bulk charge effect in the presence of drift velocity saturation, channel length modulation, charge sharing by the drain and source, and temperature dependence of the critical field. The proposed model is verified by comparison with experimental device characteristics obtained over a wide range of terminal voltages, temperatures, and channel lengths.>