Demo Data from EDBT 2026 / reviewers in the wild / expert
Willem Smit
dblp:97/5721
· DBLP profile ↗
1ranked-venue papers
0as first author
0since 2021 · last 1988
—ORCID · none
Domains — the database's venue-derived domains; a paper can count in several
Systems, architecture and hardware · 1
Expertise — from the expertise taxonomy: the topics of the expert's papers under the CCF categories. A weight counts papers with recency: 1 for a paper about the topic, 0.3 when the topic is its context, halved every five years.
| Computer architecture, parallel and distributed computing, and storage systems
1 paper |
Electronic design automation · 100% |
Topics — the 4 heaviest of 4, each with the papers that count most for it
| Topic | Weight | Papers | Last | Evidence papers |
|---|---|---|---|---|
Electronic design automation
mesh generation |
0.0 | 1 | 1988 | The generation of a mesh for resistance calculation in integrated circuits · IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 1988 |
Electronic design automation
physical design |
0.0 | 1 | 1988 | The generation of a mesh for resistance calculation in integrated circuits · IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 1988 |
Electronic design automation › interconnect modeling
resistance calculation |
0.0 | 1 | 1988 | The generation of a mesh for resistance calculation in integrated circuits · IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 1988 |
Electronic design automation › physical design
parasitic extraction |
0.0 | 1 | 1988 | The generation of a mesh for resistance calculation in integrated circuits · IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. 1988 |
Methods — techniques the papers use, named apart from their topics
node elimination · 0.0mesh refinement · 0.0laplace equation solution · 0.0
| Year | Publication | Venue | Position |
|---|---|---|---|
| 1988 | The generation of a mesh for resistance calculation in integrated circuitsabstractA method of generating a two-dimensional irregular mesh on a resistive shape is presented. Heuristics are used to identify critical areas where small mesh elements are required. Mesh refinement is applied in these areas until elements are smaller than a specified size. In noncritical areas, elements have a natural tendency to increase in size at a restricted rate. Rapid generation of the mesh is accomplished by using a treelike approach to data processing and by using a restricted set of element types. Although the mesh can be applied to any problem that requires the solution of Laplace's equation with boundary conditions, resistive shapes in integrated circuits are the authors' prime focus. The node elimination technique for resistance calculation is used to demonstrate the effectiveness of the mesh for this purpose.> Albertus J. Kemp, Jacobus A. Pretorius, Willem Smit |
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. | 3 |